A new technical paper titled “A Case for Hypergraphs to Model and Map SNNs on Neuromorphic Hardware” was published by ...
A new technical paper titled “Oxide Semiconductor for Advanced Memory Architectures: Atomic Layer Deposition, Key Requirement ...
Efficient SLM Edge Inference via Outlier-Aware Quantization and Emergent Memories Co-Design” was published by researchers at ...
A new technical paper titled “Improving Contact Resistance in Top-Gate Carbon Nanotube Transistor through Self-Aligned MoOx ...
A new technical paper, “Secure Multi-Path Routing with All-or-Nothing Transform for Network-on-Chip Architectures,” was ...
A new technical paper titled “Advances in waveguide to waveguide couplers for 3D integrated photonic packaging” was published ...
Trojan Detection in COTS Hardware via Statistical Activation of Microarchitectural Events” was published by researchers at ...
Over 40% of semiconductor facilities announced since 2021 are located in watersheds projected to face high water stress between 2030 and 2040.
Amorphous oxide semiconductors like IGZO (indium gallium zinc oxide) offer acceptable carrier mobility with very low leakage.
How atomic-layer deposition and hybrid dielectrics are redefining reliability and scaling for AI-era semiconductors.
Recently, that number has risen to five, and while it adds far more flexibility for structuring electronic equipment, it also ...