In the creative, or desperate, rush to find ways to pattern 10 nm node using double patterning immersion 193nm lithography, a designer from ARM is left “crying in his beer” at the consequent design ...
SAN JOSE, Calif. — Immersion lithography could be late to the market, forcing chip makers to consider 193-nm “dry” and double-exposure techniques for chip production at the 45-nm node and beyond, ...
Double patterning is a class of technologies developed for photolithography to enhance the feature density of computer chips. The resolution of a photoresist pattern begins to blur at around 45 nm ...
Experts at the Table: Semiconductor Engineering sat down to discuss extreme ultraviolet (EUV) lithography and other next-generation fab technologies with Jerry Chen, head of global business ...
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